The starting signal for our new project has been fired! This year we are working on making our ELWIMAT-VFS DualWave with 4DoF evaluation ready for series production. This means that with this sensor we simultaneously measure the angle and the lateral position in two orthogonal directions X and Y using two wavelengths (DualWave) and a combination reflector. One wavelength is reflected on the partially transparent plane mirror and is used to measure the angle. The second wavelength is transmitted and reflected back via retro-reflection at the prism reflector and is used to measure position in two directions. We already use similar equipment to assemble assemblies in semiconductor inspection systems and to assemble and adjust laser systems in selective laser melting SLM or 3D metal printing. The latest system described here is used for the quick assembly and adjustment of mirror and optics assemblies in microscope assembly while simultaneously viewing all 4 degrees of freedom. The new ELWIMAT-VFS DualWave system delivers up to 20 measured values per second for each of the 4 values. The picture shows the arrangement on the test stand in the calibration laboratory, where the angles in the range of +/- 2 degrees are calibrated to < 0.02 wmin and the lateral positions in the range of +/- 20 mm to < 1 to 2 micrometers.
